Growth of TiO2 Thin Films by High Energy Milling Assisted Pulsed Laser Deposition Method

Abstract

TiO2 thin film can be deposited on the silicon substrate using pulse laser deposition method. To prove homogeneity of grain size on surface, this study uses milling treatment for TiO2 powder before it is deposited. Milling treatment was conducted on samples of commercial TiO2 powder with high energy milling method. The variation of milling time was 0, 1, 3 and 6 hours. Furthermore, the samples were shaped as disc with diameter of 1 cm and used as a target source in growth of thin film. Variations in time for the milling treatment of the TiO2 powder has no effect on the phase change, but rather on the homogeneity of grain size on a thin layer of TiO2. In this study, the optimum milling time to produce a homogeneous grain size of a thin layer of TiO2 for 3 hours.