Short Channel Effect of SOI Vertical Sidewall MOSFET

Suseno, Jatmiko Endro and Riyadi, Munawar A. and Ismail, Razali (2008) Short Channel Effect of SOI Vertical Sidewall MOSFET. In: 2008 IEEE International Conference on Semiconductor Electronics, 25 – 27 November, 2008, Persada Johor International Convention Centre, Johor Bahru, Johor, Malaysia.

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Application of asymmetric sidewall vertical metal oxide semiconductor field effect transistors (MOSFETs) is hindered by the parasitic overlap capacitance associated with their layout, which is considerably larger than for a lateral MOSFET on the same technology node. A simple process simulation has been developed to reduce the parasitic overlap capacitance in the asymmetric sidewalls vertical MOSFETs by using SOI (Silicon on Insulator) in bottom planar surfaces side. The result shows that while channel length decreases, the threshold voltage goes lower, the DIBL rises and subthreshold swing tends to decrease, for both structures. It is noted that the SVS MOSFET structure generally have better performance in SCE control compared to bulk vertical MOSFET. The presence of buried oxide is believed to increase the performance of vertical MOSFET, essentially in controlling the depletion in subthreshold voltage.

Item Type:Conference or Workshop Item (Paper)
Subjects:T Technology > TK Electrical engineering. Electronics Nuclear engineering
Q Science > QC Physics
Divisions:Faculty of Science and Mathematics > Diploma in Instrumentasi and Electronics
Faculty of Science and Mathematics > Department of Physics
ID Code:52071
Deposited By:Mr Instrumentasi MIPA
Deposited On:01 Mar 2017 09:25
Last Modified:01 Mar 2017 09:25

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