Susanto , Nanag (2000) Pengaruh ketebalan lapisan tipis bahan Organik Toluene Terpolimer terhadap karakteristik dioda logam - organik - semikonduktor (L-Or-S). Undergraduate thesis, FMIPA UNDIP.
PDF Restricted to Repository staff only 2215Kb | ||
| PDF 17Kb | |
| PDF 357Kb | |
| PDF 499Kb | |
| PDF 420Kb | |
| PDF 838Kb | |
| PDF 607Kb | |
PDF Restricted to Repository staff only 504Kb | ||
| PDF 345Kb | |
| PDF 340Kb | |
| PDF 663Kb |
Abstract
Telah dilakukan pembuatan dioda L-I-S (Logam-Isolator-Semikonduktor) untuk dipelajari karakteristiknya (:Pengaruh ketebalan isolator terhadap karakteristik kapasitansi-tegangan (C-V) dan arus-tegangan (I-V) nya. Susunan dioda yang dibuat terdiri atas : logam Ag (perak), Isolator (bahan organik Toluene), Semikonduktor (silikon tipe-n) dan logam Al (Alumunium). Teknik pembuatan dioda L-I-S menggunakan sistem deposisi berkas ion plasma untuk mendeposisikan lapisan tipis bahan organik Toluene pada permukaan semikonduktor. Pendeposisian perak di atas permukaan bahan organik Toluene yang terpolimer sebagai kontak elektroda dan alumunium di bawah semikonduktor sebagai kontak ohrnik pada dioda yang dibuat dilakukan dengan teknik evaporasi. Hasil karakterisasi kapasitansi-tegangan menunjukkan bahwa pada suatu tegangan, kapasitansi akan menurun jika tebal lapisan tipis Toluena bertambah. Sedang hasil karakterisasi arus-tegangan menunjukkan bahwa semakin tebal lapisan tipis Toluena yang digunakan maka nilai dari tegangan potong-masuk (cut-in voltage) dan tegangan dadal (breakdown voltage) bertambah besar Pula. Manufacturing of Metal-Isolator-Semiconductor (MIS) diode have been done for studying its characteristic (e.g; effects of isolator thickness to characteristics of capaacitance-voltage (C-V) and voltage-current (V-I)). Compositions of MIS diode consist of silver metal (Ag), isolator (Toluene organic material), semiconductor (n-type silicon) and alumunium metal (Al). Manufacturing technique of U-Or-S diode consists two steps: Depositioning a thin layer of organic Toluene materials on a semiconductor has been done by using plasma ion beam deposition system. Evaporation system has been used for depositioning silver metal on a thin layer of organic Toluene material polimerized as an electrode contact and alumunium metal under a semiconductor as ohmic contact. Results of capacitance-voltage characterization show that in a voltage, capacitance value decreases since thickness of thin layer of toluena increases. Thus, results of that of voltage-current show that, the thicker thin layer of used toluena, the higher values of cut-in voltage and breakdown voltage. xii
Item Type: | Thesis (Undergraduate) |
---|---|
Subjects: | Q Science > QC Physics |
Divisions: | Faculty of Science and Mathematics > Department of Physics |
ID Code: | 30486 |
Deposited By: | Mr UPT Perpus 1 |
Deposited On: | 31 Oct 2011 14:20 |
Last Modified: | 31 Oct 2011 14:20 |
Repository Staff Only: item control page